langmuir probe meaning in Chinese
兰米尔测量仪
朗格缪尔探针
朗缪尔探针
Examples
- A reciprocationg langmuir probe system in front of the lh launcher and the measurements for local sol layer
低杂波天线前的快往复探针系统及其对刮削层的测量 - We tested the ecr deposition system and plasma parameters with the help of langmuir probe and faraday cup
我们还介绍了bn薄膜的特性、应用和bn体系相关系的研究。 - This paper mainly study on the technics of preparing nano - si3n4 and icpecvd . seeking for the proper parameter and technics , crystallization of nano - si3n4 powder with muffle furnace , probe the new effective way of improving the properties of nano - si3n4 powder the ion density in the reaction chamber was diagnosed by a langmuir probe . the rules were obtained under different air pressure , different radio frequency power and different position which the ion density changes about from 1010cm - 3 to 1010cm - 3 decreasing as the pressure increases and increasing as the power decreases
利用朗缪尔探针诊断了反应室内等离子体参数，得到不同位置、不同功率和不同气压下等离子体密度的变化规律，结果表明离子密度为10 ~ 8 10 ~ ( 10 ) cm ~ ( - 3 ) ，等离子体密度随着功率的增大而增大，随着气压的升高而减小，由于离子鞘层的存在，在一定条件下提供了局部等离子体密度稳定的区域。 - In this thesis , we have mainly studied the characteristics of chf3 , c6h6 and cf4 electron cyclotron resonance ( ecr ) plasma using langmuir probe and optical emission spectroscopy ( oes ) . the relative concentration of different radicals in chf3 plasma and the effect of chf3 / c6h6 ratio on bond configuration of a - c : f films were discussed . it was showed that h , f , c2 were the main radicals among radicals of h , f , c2 , ch and f2 in chf3 ecr plasma
重点研究了chf _ 3 、 cf _ 4和chf _ 3 c _ 6h _ 6放电等离子体中基团的分布；分析了不同基团的相对密度随宏观放电条件(微波输入功率、放电气压、源气体流量比)的变化规律；探讨了等离子体中各种基团的生成途径；在不同源气体流量比的条件下沉积了a - c ： f薄膜并通过傅立叶变化红外吸收光谱( ftir )的测量得到了薄膜中键结构的信息；分析了a - c ： f薄膜的沉积速率及其键结构与等离子体空间基团分布状态之间的关联。